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ISSN:0267-9477

1CRM 1GD-OES 1calibration 1copper substrate 1depth profiling analysis 1glow discharge optical emission spectroscopy 1rf-GDOES 1thiourea molecules

1Aeberhard, Max 1Chapon, Patrick 1Habazaki, H. 1Michler, Johann 1Nelis, Thomas 1Payling, R. 1Payling, Richard 1Shimizu, K. 1Skeldon, P. 1Thompson, G. E.

Facets

1CRM 1GD-OES 1calibration 1copper substrate 1depth profiling analysis 1glow discharge optical emission spectroscopy 1rf-GDOES 1thiourea molecules

1Aeberhard, Max 1Chapon, Patrick 1Habazaki, H. 1Michler, Johann 1Nelis, Thomas 1Payling, R. 1Payling, Richard 1Shimizu, K. 1Skeldon, P. 1Thompson, G. E.

Title
Creator
Date

Relative calibration mode for compositional depth profiling in GD-OES

- Nelis, Thomas, Aeberhard, Max, Payling, Richard, Michler, Johann, Chapon, Patrick

Creator: Nelis, Thomas , Aeberhard, Max , Payling, Richard , Michler, Johann , Chapon, Patrick
Resource Type: journal article
Date: 2004

Rf-GDOES depth profiling analysis of a monolayer of thiourea adsorbed on copper

- Shimizu, K., Payling, R., Habazaki, H., Skeldon, P., Thompson, G. E.

Creator: Shimizu, K. , Payling, R. , Habazaki, H. , Skeldon, P. , Thompson, G. E.
Resource Type: journal article
Date: 2004

1

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